000 | 03865nam a22005655i 4500 | ||
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001 | 978-94-007-7781-1 | ||
003 | DE-He213 | ||
005 | 20200421111845.0 | ||
007 | cr nn 008mamaa | ||
008 | 131113s2014 ne | s |||| 0|eng d | ||
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_a9789400777811 _9978-94-007-7781-1 |
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024 | 7 |
_a10.1007/978-94-007-7781-1 _2doi |
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050 | 4 | _aTK7867-7867.5 | |
072 | 7 |
_aTJFC _2bicssc |
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_aTJFD5 _2bicssc |
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072 | 7 |
_aTEC008010 _2bisacsh |
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082 | 0 | 4 |
_a621.3815 _223 |
100 | 1 |
_aZjajo, Amir. _eauthor. |
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245 | 1 | 0 |
_aStochastic Process Variation in Deep-Submicron CMOS _h[electronic resource] : _bCircuits and Algorithms / _cby Amir Zjajo. |
264 | 1 |
_aDordrecht : _bSpringer Netherlands : _bImprint: Springer, _c2014. |
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300 |
_aXIX, 192 p. 46 illus. _bonline resource. |
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_atext _btxt _2rdacontent |
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_acomputer _bc _2rdamedia |
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_aonline resource _bcr _2rdacarrier |
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_atext file _bPDF _2rda |
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490 | 1 |
_aSpringer Series in Advanced Microelectronics, _x1437-0387 ; _v48 |
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505 | 0 | _a1 Introduction -- 2 Random Process Variation in Deep-Submicron CMOS -- 3 Electronic Noise in Deep-Submicron CMOS -- 4 Thermal Effects in Deep-Submicron CMOS -- 5 Circuit Solutions -- 6 Conclusions and Recommendations -- Appendix. References -- Acknowledgement -- About the Author. | |
520 | _aOne of the most notable features of nanometer scale CMOS technology is the increasing magnitude of variability of the key device parameters affecting performance of integrated circuits. The growth of variability can be attributed to multiple factors, including the difficulty of manufacturing control, the emergence of new systematic variation-generating mechanisms, and most importantly, the increase in atomic-scale randomness, where device operation must be described as a stochastic process. In addition to wide-sense stationary stochastic device variability and temperature variation, existence of non-stationary stochastic electrical noise associated with fundamental processes in integrated-circuit devices represents an elementary limit on the performance of electronic circuits. In an attempt to address these issues, Stochastic Process Variation in Deep-Submicron CMOS: Circuits and Algorithms offers unique combination of mathematical treatment of random process variation, electrical noise and temperature and necessary circuit realizations for on-chip monitoring and performance calibration. The associated problems are addressed at various abstraction levels, i.e. circuit level, architecture level and system level. It therefore provides a broad view on the various solutions that have to be used and their possible combination in very effective complementary techniques for both analog/mixed-signal and digital circuits. The feasibility of the described algorithms and built-in circuitry has been verified by measurements from the silicon prototypes fabricated in standard 90 nm and 65 nm CMOS technology. . | ||
650 | 0 | _aPhysics. | |
650 | 0 | _aBiomathematics. | |
650 | 0 | _aElectronic circuits. | |
650 | 0 | _aStatistical physics. | |
650 | 0 | _aDynamical systems. | |
650 | 0 | _aApplied mathematics. | |
650 | 0 | _aEngineering mathematics. | |
650 | 1 | 4 | _aPhysics. |
650 | 2 | 4 | _aElectronic Circuits and Devices. |
650 | 2 | 4 | _aCircuits and Systems. |
650 | 2 | 4 | _aStatistical Physics, Dynamical Systems and Complexity. |
650 | 2 | 4 | _aAppl.Mathematics/Computational Methods of Engineering. |
650 | 2 | 4 | _aPhysiological, Cellular and Medical Topics. |
710 | 2 | _aSpringerLink (Online service) | |
773 | 0 | _tSpringer eBooks | |
776 | 0 | 8 |
_iPrinted edition: _z9789400777804 |
830 | 0 |
_aSpringer Series in Advanced Microelectronics, _x1437-0387 ; _v48 |
|
856 | 4 | 0 | _uhttp://dx.doi.org/10.1007/978-94-007-7781-1 |
912 | _aZDB-2-ENG | ||
942 | _cEBK | ||
999 |
_c55786 _d55786 |